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        Plasma Science and Technology - Progress in Physical States and Chemical Reactions

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        Contributor(s)
        Mieno, Tetsu (editor)
        Language
        English
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        Abstract
        In the early twentieth century, Dr. Irving Langmuir actively studied plasma discharge and surface science. Since then, great progress has been made in the development of applications of discharges and plasmas such as discharge lamps, electric tubes, and arc welding. In relation to studies on space physics and controlled nuclear fusion, plasma physics has greatly advanced. Plasma chemistry has also progressed along with its applications in LSI fabrication technology, the chemical vapor deposition of functional films, and the production of nanomaterials. In the twenty-first century, the further development of applications of plasma physics and plasma chemistry is certainly expected. In this book, 18 chapters on the recent progress in plasma science and technology have been written by active specialists worldwide.
        URI
        http://library.oapen.org/handle/20.500.12657/32357
        Keywords
        plasma science; technology
        DOI
        10.5772/60692
        ISBN
        9789535122807
        OCN
        1030823023
        Publisher
        InTechOpen
        Publisher website
        https://www.intechopen.com/
        Publication date and place
        2016
        Classification
        Science: general issues
        Pages
        574
        Chapters in this book
        • Chapter 8 Non-thermal Plasma Technology for the Improvement of Scaffolds for Tissue Engineering and Regenerative Medicine - A Review
        Rights
        • Imported or submitted locally

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        License

        • If not noted otherwise all contents are available under Attribution 4.0 International (CC BY 4.0)

        Credits

        • logo EU
        • This project received funding from the European Union's Horizon 2020 research and innovation programme under grant agreement No 683680, 810640, 871069 and 964352.

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